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Proceedings Paper

Low-speckle holographic beam shaping of high-coherence EUV sources
Author(s): Christopher N. Anderson; Ryan H. Miyakawa; Patrick P. Naulleau
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Paper Abstract

This paper describes a method to arbitrarily shape and homogenize high-coherence extreme ultraviolet sources using time-varying holographic optical elements and a scanning subsystem to mitigate speckle. In systems with integration times longer than 100 ms, a speckle contrast below 1% can be achieved.

Paper Details

Date Published: 8 April 2011
PDF: 5 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 796938 (8 April 2011); doi: 10.1117/12.881553
Show Author Affiliations
Christopher N. Anderson, Lawrence Berkeley National Lab. (United States)
Ryan H. Miyakawa, Lawrence Berkeley National Lab. (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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