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Proceedings Paper

BARC surface property matching for negative-tone development of a conventional positive-tone photoresist
Author(s): Douglas J. Guerrero; Vandana Krishnamurthy; Daniel M. Sullivan
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Paper Abstract

The main properties controlling a successful negative-tone development (NTD) process include surface energy of the BARC or silicon hardmask, reflectivity control, and type of spin-on carbon (SOC) layer utilized. In this paper, we studied the BARC and silicon-containing hardmask properties needed to achieve successful NTD of a conventional positive-tone photoresist. The surface energy mismatch between BARC and silicon-containing hardmask poses challenges for patterning dense structures. Interaction of the SOC layer and the photoresist was observed, even with the silicon hardmask film present in between these two layers. Strict reflectivity elimination does not guarantee a successful outcome, rather precise control of reflectivity is required to enhance the overall lithographic process.

Paper Details

Date Published: 15 April 2011
PDF: 7 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79720Q (15 April 2011); doi: 10.1117/12.881508
Show Author Affiliations
Douglas J. Guerrero, Brewer Science, Inc. (United States)
Vandana Krishnamurthy, Brewer Science, Inc. (United States)
Daniel M. Sullivan, Brewer Science, Inc. (United States)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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