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Proceedings Paper

High-range laser light bandwidth measurement and tuning
Author(s): Kevin O'Brien; Rui Jiang; Nora Han; Efrain Figueroa; Raj Rao; Robert J. Rafac
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Paper Abstract

High performance lithography is increasingly demanding light sources to deliver laser light over a much larger range of stabilized bandwidths. The applications range from improved optical proximity correction (OPC) to the high-speed printing of vias and contact holes, through a process called focus drilling. Several advances in light source technology must integrate to provide the improved bandwidth performance required by the industry. This paper will outline three of the core technologies developed by Cymer and integrated into its most advanced XLATM and XLRTM series light sources to meet this need. Novel improvements in line narrowing offer the actuation necessary to tune the bandwidth over the large range. Advanced bandwidth metrology yields accurate measurements of the bandwidth over the wide range. And new controls and feedback algorithms provide the integration to stabilize the bandwidth to the desired target. The result provides laser light bandwidths that can be tuned to and accurately stabilized at any spectral E95 target from 0.3 pm to 1.6 pm, while maintaining all other laser performance parameters. The feature is called focus drilling. Focus drilling extends the utility of Cymer XLA and XLR lasers by adding more flexibility to the light source, allowing the end-user chipmaker to select the exact properties of the laser light necessary for a wider range of process steps. The article will discuss the above technologies and emphasize their important aspects. It will also highlight some of the key performance aspects using data from Cymer's testing. Some of the design features and trade-offs will be provided, and a few of the relevant metrics will be presented and justified. Finally, potential future improvements to the technology will be presented.

Paper Details

Date Published: 22 March 2011
PDF: 9 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 797326 (22 March 2011); doi: 10.1117/12.881167
Show Author Affiliations
Kevin O'Brien, Cymer, Inc. (United States)
Rui Jiang, Cymer, Inc. (United States)
Nora Han, Cymer, Inc. (United States)
Efrain Figueroa, Cymer, Inc. (United States)
Raj Rao, Cymer, Inc. (United States)
Robert J. Rafac, Cymer, Inc. (United States)

Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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