Share Email Print
cover

Proceedings Paper

Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner
Author(s): Frank Staals; Alena Andryzhyieuskaya; Hans Bakker; Marcel Beems; Jo Finders; Thijs Hollink; Jan Mulkens; Angelique Nachtwein; Rob Willekers; Peter Engblom; Toralf Gruner; Youping Zhang
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

In this paper we describe the basic principle of FlexWave, a new high resolution wavefront manipulator, and discuss experimental data on imaging, focus and overlay. For this we integrated the FlexWave module in a 1.35 NA immersion scanner. With FlexWave we can perform both static and dynamic wavefront corrections. Wavefront control with FlexWave minimizes lens aberrations under high productivity usage of the scanner, hence maintaining overlay and focus performance, but moreover, the high resolution wavefront tuning can be used to compensate for litho related effects. Especially now mask 3D effects are becoming a major error component, additional tuning is required. Optimized wavefront can be achieved with computational lithography, by either co-optimizing source, mask, and Wavefront Target prior to tape-out, or by tuning Wavefront Targets for specific masks and scanners after the reticle is made.

Paper Details

Date Published: 22 March 2011
PDF: 13 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79731G (22 March 2011); doi: 10.1117/12.880759
Show Author Affiliations
Frank Staals, ASML Netherlands B.V. (Netherlands)
Alena Andryzhyieuskaya, ASML Netherlands B.V. (Netherlands)
Hans Bakker, ASML Netherlands B.V. (Netherlands)
Marcel Beems, ASML Netherlands B.V. (Netherlands)
Jo Finders, ASML Netherlands B.V. (Netherlands)
Thijs Hollink, ASML Netherlands B.V. (Netherlands)
Jan Mulkens, ASML Netherlands B.V. (Netherlands)
Angelique Nachtwein, ASML Netherlands B.V. (Netherlands)
Rob Willekers, ASML Netherlands B.V. (Netherlands)
Peter Engblom, ASML Boise (United States)
Toralf Gruner, Carl Zeiss SMT AG (Germany)
Youping Zhang, Brion Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

© SPIE. Terms of Use
Back to Top