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Proceedings Paper

Nanometer scale imaging with table top extreme ultraviolet sources
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Paper Abstract

Decreasing the illumination wavelength allows to improve the spatial resolution in photon-based imaging systems and enables a nanometer-scale spatial resolution. Due to a significant interest in nanometer-scale spatial resolution imaging short wavelengths from extreme ultraviolet (EUV) region are often used. A few examples of various imaging techniques, such as holography, zone plate EUV microscopy, computer generated hologram EUV reconstruction, lens-less diffraction imaging and generalized Talbot self-imaging will be presented utilizing coherent and incoherent EUV sources. Some of these EUV imaging techniques lead to the high spatial resolution, better than 50nm in a very short exposure time. The techniques, presented herein, have potential to be used in actinic mask inspection for EUV lithography, mask-less lithographic processes in the nanofabrication, in material science or biology.

Paper Details

Date Published: 14 December 2010
PDF: 14 pages
Proc. SPIE 7746, 17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 774609 (14 December 2010); doi: 10.1117/12.880340
Show Author Affiliations
Przemyslaw W. Wachulak, Military Univ. of Technology (Poland)
Richard L. Sandberg, Los Alamos National Lab. (United States)
Artak Isoyan, Univ. of Wisconsin-Madison (United States)
Lukasz Urbanski, Colorado State Univ. (United States)
Andrzej Bartnik, Military Univ. of Technology (Poland)
Randy A. Bartels, Colorado State Univ. (United States)
Carmen S. Menoni, Colorado State Univ. (United States)
Henryk Fiedorowicz, Military Univ. of Technology (Poland)
Jorge J. Rocca, Colorado State Univ. (United States)
Mario C. Marconi, Colorado State Univ. (United States)


Published in SPIE Proceedings Vol. 7746:
17th Slovak-Czech-Polish Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Jarmila Müllerová; Dagmar Senderáková; Stanislav Jurečka, Editor(s)

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