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Proceedings Paper

Environmentally friendly natural materials-based photoacid generators for next-generation photolithography
Author(s): Youngjin Cho; Christine Y. Ouyang; Marie Krysak; Wenjie Sun; Victor Gamez; Reyes Sierra-Alvarez; Christopher K. Ober
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Paper Abstract

We describe the development of new triphenylsulfonium photoacid generators (TPS PAGs) with semifluorinated sulfonate anions containing glucose or other natural product groups, and their successful application to patterning sub-100 nm features using 254 nm and e-beam lithography. The TPS PAGs with functionalized octafluoro-3-oxapentanesulfonate were synthesized efficiently in high purity and high yield by utilizing simple and unique chemistries on 5-iodooctafluoro-3-oxapentanesulfonyl fluoride. The PAGs has been fully evaluated in terms of chemical properties, lithographic performance, environmental friendliness or toxicological impact. The PAGs are non-toxic and it is susceptible to chemical degradation and to microbial attack under aerobic/anaerobic conditions. These new PAGs are very attractive materials for high resolution photoresist applications and they are particularly useful in addressing the environmental concerns caused by PFOS and other perfluoroalkyl surfactants.

Paper Details

Date Published: 15 April 2011
PDF: 11 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79722A (15 April 2011); doi: 10.1117/12.879816
Show Author Affiliations
Youngjin Cho, Cornell Univ. (United States)
Christine Y. Ouyang, Cornell Univ. (United States)
Marie Krysak, Cornell Univ. (United States)
Wenjie Sun, The Univ. of Arizona (United States)
Victor Gamez, The Univ. of Arizona (United States)
Reyes Sierra-Alvarez, The Univ. of Arizona (United States)
Christopher K. Ober, Cornell Univ. (United States)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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