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Proceedings Paper

High sensitive and fast scanner focus monitoring method using forbidden pitch pattern
Author(s): Jinseok Heo; Jeong-Ho Yeo; Younghee Kim
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Paper Abstract

Forbidden pitch which is introduced under a dipole illumination condition has extremely narrow DOF (Depth Of Focus). Therefore when a lithographic pattern is transferred on a wafer the forbidden pitch should be removed from the layout. However this narrow DOF behavior can be utilized to monitor a focus of scanner systems due to its sensitiveness to focus changes. In this paper, a newly developed focus monitoring method utilizing a forbidden pitch pattern will be introduced and the benefits and sensitivity of this method will be discussed in details.

Paper Details

Date Published: 20 April 2011
PDF: 6 pages
Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79711C (20 April 2011); doi: 10.1117/12.879802
Show Author Affiliations
Jinseok Heo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jeong-Ho Yeo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Younghee Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7971:
Metrology, Inspection, and Process Control for Microlithography XXV
Christopher J. Raymond, Editor(s)

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