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Proceedings Paper

High-brightness LPP source for actinic mask inspection
Author(s): S. Ellwi; F. Abreau
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Paper Abstract

EUV actinic mask inspection requires a light source with high brightness, high uptime and a small footprint. Adlyte Corporation has developed reliable, compact and cost-effective EUV sources for mask metrology and inspection applications with potential to be extended for scanner high volume manufacturing. The EUV source will generate high brightness of up to 1 kW/mm2·sr. An industry-proven high power Nd:YAG laser irradiates high-frequency tin droplets with 1.6 kW of power in short pulses. For extended operational lifetime and with high reliability, the collector integrates two methods to mitigate ionic and neutral debris, and actively manages the thermal load. Latest operational data will be presented.

Paper Details

Date Published: 29 March 2011
PDF: 7 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79690C (29 March 2011); doi: 10.1117/12.879786
Show Author Affiliations
S. Ellwi, Adlyte Corp. (Switzerland)
F. Abreau, Adlyte Corp. (Switzerland)


Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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