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Proceedings Paper

Fine calibration of physical resist models: the importance of Jones pupil, laser bandwidth, mask error and CD metrology for accurate modeling at advanced lithographic nodes
Author(s): Seongho Moon; Seunghune Yang; Artem Shamsuarov; Eunju Kim; Junghoon Ser; Youngchang Kim; Seongwoon Choi; Changjin Kang; Ulrich Klostermann; Bernd Küchler; John Lewellen; Thomas Schmöller; Sooryong Lee
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Paper Abstract

In this paper, we discuss the accuracy of resist model calibration under various aspects. The study is done based on an extensive OPC dataset including hundreds of CD values obtained with immersion lithography for the sub-30 nm node. We address imaging aspects such as the role of Jones matrices, laser bandwidth and mask bias. Besides we focus on the investigation on metrology effects arising from SEM charging and uncertainty between SEM image and feature topography. For theses individual contributions we perform a series of resist model calibrations to determine their importance in terms of relative RMSE (Root Mean Square Error) and it is found that for the sub-30 nm node they all are not negligible for accurate resist model calibration.

Paper Details

Date Published: 23 March 2011
PDF: 8 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79730X (23 March 2011); doi: 10.1117/12.879592
Show Author Affiliations
Seongho Moon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seunghune Yang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Artem Shamsuarov, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Eunju Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Junghoon Ser, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Youngchang Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seongwoon Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Changjin Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Ulrich Klostermann, Synopsys Inc. (Germany)
Bernd Küchler, Synopsys Inc. (Germany)
John Lewellen, Synopsys, Inc. (United States)
Thomas Schmöller, Synopsys Inc. (Germany)
Sooryong Lee, Synopsys Inc. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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