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Proceedings Paper

A study of conductive material for e-beam lithography
Author(s): Wen-Yun Wang; Chen-Yu Liu; Tsung-Chih Chien; Chun-Ching Huang; Shy-Jay Lin; Ya-Hui Chang; Jack J.H. Chen; Ching-Yu Chang; Yao-Ching Ku; Burn J. Lin
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Paper Abstract

Unlike optical systems, electron-charging effect is a concern for e-beam lithography. Accumulated charge on the resist will perturb the route of incident electrons, resulting in pattern distortion or failure. Therefore, reducing charge accumulation becomes an important topic for high-pattern-density e-beam applications. In this paper, we used a conductive material as the resist substrate for charging effect evaluation. The e-beam source from CD-SEM (Critical Dimension SEM) was initially used to conductive performance qualification. When comparing with non-conductive BARC, we found that the experimental conductive material has an additional 11% to 14% resist-shrinkage than a non-conducting BARC. However, we cannot repeat this phenomenon in the multiple-e-beam (MEB) imaging tool. From Monte Carlo simulation, the electrons deeply penetrate through the substrate instead of being trapped in the resist substrate. It further indicates that although conductive bottom layer can dissipate electron effectively for surface charging, the film scheme as well as tool grounding are also important for minimizing the charging effect.

Paper Details

Date Published: 16 April 2011
PDF: 11 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 797228 (16 April 2011); doi: 10.1117/12.879575
Show Author Affiliations
Wen-Yun Wang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chen-Yu Liu, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Tsung-Chih Chien, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Chun-Ching Huang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Shy-Jay Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Ya-Hui Chang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Jack J.H. Chen, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Ching-Yu Chang, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Yao-Ching Ku, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)
Burn J. Lin, Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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