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Proceedings Paper

RS-Mini: an enterprise class highly compact mask inspection defect management framework for the mask and wafer fab infrastructure
Author(s): Saghir Munir
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Paper Abstract

Information is 'key'. Timely information in a fab environment provides substantial insight into the Mask quality, process health, steps needed to improve yield and throughout time. Ideal for mask and wafer fabs, the RS-Mini central server brings the inspection tool's terminal to the end user via a desktop application. Hundreds of users can simultaneously classify (with automation capability), annotate repair history, query and summarize year's worth of inspection results with images from tens of tools, as well as establish defect and process health trends in a matter of seconds. The RS-Mini, a low cost, state of the art mask defect management framework delivering a highly integrated rich user experience, fits in a compact rack mountable server blade less than 2 inches in thickness.

Paper Details

Date Published: 20 April 2011
PDF: 13 pages
Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79712Q (20 April 2011); doi: 10.1117/12.879569
Show Author Affiliations
Saghir Munir, Reticle Labs. (United States)


Published in SPIE Proceedings Vol. 7971:
Metrology, Inspection, and Process Control for Microlithography XXV
Christopher J. Raymond, Editor(s)

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