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Proceedings Paper

Polarization holograms for source-mask optimization
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Paper Abstract

A new technique is introduced to replace DOEs that are used for illumination in lithographic projectors with polarization computer generated holograms (PCGHs) that produce both arbitrary intensity and arbitrary polarization state in the illumination pupil. The additional capability of arbitrary polarization state adds an additional degree of freedom for source-mask optimization. The PCGHs are similar in design and construction to DOEs, but they incorporate polarizationsensitive elements. Three experiments are described that demonstrate different configurations of PCGHs deigned to produce a tangentially polarized ring. Measurements of ratio of polarization and polarization orientation indicate that all three configurations performed well. Experimetns are performed with visible (λ = 632.8nm) light.

Paper Details

Date Published: 5 April 2011
PDF: 8 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79731A (5 April 2011); doi: 10.1117/12.879534
Show Author Affiliations
T. D. Milster, College of Optical Sciences, The Univ. of Arizona (United States)
H. Noble, College of Optical Sciences, The Univ. of Arizona (United States)
E. Ford, College of Optical Sciences, The Univ. of Arizona (United States)
W. Dallas, College of Optical Sciences, The Univ. of Arizona (United States)
R. A. Chipman, College of Optical Sciences, The Univ. of Arizona (United States)
I. Matsubara, Canon U.S.A., Inc. (United States)
Y. Unno, Canon U.S.A., Inc. (United States)
S. McClain, College of Optical Sciences, The Univ. of Arizona (United States)
P. Khulbe, College of Optical Sciences, The Univ. of Arizona (United States)
W. S. T. Lam, College of Optical Sciences, The Univ. of Arizona (United States)
D. Hansen, College of Optical Sciences, The Univ. of Arizona (United States)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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