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Proceedings Paper

Overlay measurements by Mueller polarimetry in the back focal plane
Author(s): Tatiana Novikova; Clément Fallet; Martin Foldyna; Sandeep Manhas; Bicher Haj Ibrahim; Antonello De Martino; Cyril Vannuffel; Christophe Constancias
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Paper Abstract

Angle resolved Mueller polarimetry implemented as polarimetric imaging of the back focal plane of a high NA microscope objective has already demonstrated a good potential for CD metrology1. In this paper we present the experimental and numerical results which indicate that this technique may also be competitive for measurements of the overlay error δ between two gratings at different levels. Series of samples of superimposed gratings with well controlled overlay errors have been manufactured and measured with the angle resolved Mueller polarimeter. The overlay targets were 20 μm wide. When overlay error δ = 0 the absolute value of Mueller matrix elements is invariant by matrix transposition. This symmetry breaks down when δ ≠ 0. As a result, we can define the following overlay estimator matrix: Ε = |Μ | - |Μ |t. The simulations show that matrix element E14 is the most sensitive to the overlay error. In the experiments the scalar estimator of E14 was defined by averaging the pixel values over specifically chosen mask. The scalar estimator is found to vary essentially linearly with δ for the overlay values up to 50 nm. Our technique allows entering quite small overlay marks (down to 5 μm wide). The only one target measurement is needed for each overlay direction. The actual overlay value can be determined without detailed simulation of the structure provided the two calibrated overlay structures are available for each direction.

Paper Details

Date Published: 20 April 2011
PDF: 8 pages
Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 797115 (20 April 2011); doi: 10.1117/12.879499
Show Author Affiliations
Tatiana Novikova, LPICM, Ecole Polytechnique, CNRS (France)
Clément Fallet, LPICM, Ecole Polytechnique, CNRS (France)
Martin Foldyna, LPICM, Ecole Polytechnique, CNRS (France)
Sandeep Manhas, LPICM, Ecole Polytechnique, CNRS (France)
Bicher Haj Ibrahim, LPICM, Ecole Polytechnique, CNRS (France)
Antonello De Martino, LPICM, Ecole Polytechnique, CNRS (France)
Cyril Vannuffel, CEA-LETI (France)
Christophe Constancias, CEA-LETI (France)


Published in SPIE Proceedings Vol. 7971:
Metrology, Inspection, and Process Control for Microlithography XXV
Christopher J. Raymond, Editor(s)

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