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Proceedings Paper

Qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator
Author(s): Gregory McIntyre; Daniel Corliss; Remco Groenendijk; Rene Carpaij; Ton van Niftrik; Guillaume Landie; Takao Tamura; Thomas Pepin; James Waddell; Jerry Woods; Chris Robinson; Kehan Tian; Richard Johnson; Scott Halle; Ryoung-Han Kim; Erin Mclellan; Hirokazu Kato; Anthony Scaduto; Carl Maier; Matt Colburn
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Paper Abstract

This paper will describe the development, qualification, monitoring, and integration into a production environment of the world's first fully programmable illuminator for optical lithography. FlexRay TM, a programmable illuminator based on a MEMs multi-mirror array that was developed for TWINSCAN XT:19x0i and TWINSCAN NXT series ASML immersion scanners, was first installed in January 2010 at Albany Nanotech, with subsequent tools installed in IBM's East Fishkill Manufacturing facility. After a brief overview of the concept and benefits of FlexRay, this paper will provide a comprehensive assessment of its reliability and imaging performance. A CD-based pupil qualification (CDPQ) procedure will be introduced and shown to be an efficient and effective way to monitor pupil performance. Various CDPQ and in-resist measurement results will be described, offering convincing evidence that FlexRay reliably generates high-quality pupils and is well suited for high volume manufacturing at lithography's leading edge.

Paper Details

Date Published: 14 March 2011
PDF: 13 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 797306 (14 March 2011); doi: 10.1117/12.879483
Show Author Affiliations
Gregory McIntyre, IBM Advanced Lithography Research (United States)
Daniel Corliss, IBM Microelectronics (United States)
Remco Groenendijk, ASML (Netherlands)
Rene Carpaij, ASML (Netherlands)
Ton van Niftrik, ASML (Netherlands)
Guillaume Landie, STMicroelectronics (United States)
Takao Tamura, Renesas (Japan)
Thomas Pepin, ASML (Netherlands)
James Waddell, ASML (Netherlands)
Jerry Woods, ASML (Netherlands)
Chris Robinson, IBM Microelectronics (United States)
Kehan Tian, IBM Microelectronics (United States)
Richard Johnson, IBM Advanced Lithography Research (United States)
Scott Halle, IBM Advanced Lithography Research (United States)
Ryoung-Han Kim, GLOBALFOUNDRIES Inc. (United States)
Erin Mclellan, IBM Advanced Lithography Research (United States)
Hirokazu Kato, Toshiba Corp. (United States)
Anthony Scaduto, IBM Advanced Lithography Research (United States)
Carl Maier, IBM Advanced Lithography Research (United States)
Matt Colburn, IBM Advanced Lithography Research (United States)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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