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Proceedings Paper

Development of debris-mitigation tool for HVM DPP source
Author(s): Hironobu Yabuta; Shinsuke Mori; Takahiro Inoue; Yusuke Teramoto; Hiroto Sato; Kazuaki Hotta
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Paper Abstract

Debris-mitigation tools (DMTs) have been used in DPP sources and the performance has been well proven in alpha sources. In beta and HVM sources, requirement to the DMT is increasing to fulfill the power and lifetime requirements simultaneously. In order to bring DPP technology into HVM level, a high-performance DMT has been developed. It has high mitigation performance for both neutral and ionic debris, large collection angle of the collector having high optical transmission, and withstand large thermal input from the discharge source head. Experiments were carried out using mirror samples and proved sufficient performance with which no sputtering and deposition were observed.

Paper Details

Date Published: 8 April 2011
PDF: 6 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692U (8 April 2011); doi: 10.1117/12.879471
Show Author Affiliations
Hironobu Yabuta, EUVA (Japan)
Shinsuke Mori, EUVA (Japan)
Takahiro Inoue, EUVA (Japan)
Yusuke Teramoto, EUVA (Japan)
Hiroto Sato, EUVA (Japan)
Kazuaki Hotta, EUVA (Japan)

Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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