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Proceedings Paper

Tailorable BARC system to provide optimum solutions for various substrates in immersion lithography
Author(s): Michael Swope; Vandana Krishnamurthy; Zhimin Zhu; Daniel Sullivan; Sean Simmons; Chris Cox; Randy Bennett; Cheryl Nesbit
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Paper Abstract

It is common knowledge that the semiconductor industry continues to shrink the features contained in integrated circuits to increase speed and density. Each time the critical dimension (CD) shrinks, new challenges arise to impede the progress to attain smaller feature sizes, and control over surface reflectivity becomes even more important. Single-layer bottom anti-reflective coatings (BARCs) have been used in photolithography processes for years to reduce substrate reflectance, thus reducing or eliminating CD swing, reflective notching, and standing waves. Continued use of this solution is highly advantageous because it is well-known and cost-effective. This paper will describe a cutting-edge BARC system that has tailorable optical constants designed specifically to greatly improve immersion lithography process latitude. This BARC system can be easily modified to make formulations that match many different substrates that are being used in new devices, including highly absorbing substrates (nitrides), reflective substrates (oxide), metal layers, and hardmasks. The optimum optical parameters for this BARC system can be easily achieved through simulations. This paper will exhibit the correlation between optical simulations and lithography results.

Paper Details

Date Published: 15 April 2011
PDF: 7 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79722H (15 April 2011); doi: 10.1117/12.879462
Show Author Affiliations
Michael Swope, Brewer Science, Inc. (United States)
Vandana Krishnamurthy, Brewer Science, Inc. (United States)
Zhimin Zhu, Brewer Science, Inc. (United States)
Daniel Sullivan, Brewer Science, Inc. (United States)
Sean Simmons, Brewer Science, Inc. (United States)
Chris Cox, Brewer Science, Inc. (United States)
Randy Bennett, Brewer Science, Inc. (United States)
Cheryl Nesbit, Brewer Science, Inc. (United States)

Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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