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Proceedings Paper

Gradient-based fast source mask optimization (SMO)
Author(s): Jue-Chin Yu; Peichen Yu
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Paper Abstract

As lithography still pushing toward to low-k1 region, resolution enhancement techniques (RETs) including source optimization (SO) and mask optimization (MO) are expected to overcome the fundamentally physics in optics. Recently inverse lithography (IL) is widely studied for source and mask optimization (SMO) to enhance the resolution for over diffraction limit integrate circuit (IC) patterns. In this paper, we propose a gradient based SMO algorithm where the SO and MO are two sequential steps due to their different image formation mechanism. Moreover, we employ three cost functions including aerial and resist image and the image contrast which is proposed in our previous work. We show that IL patterns produced by SMO have better pattern fidelity and image contrast than MO only patterns.

Paper Details

Date Published: 22 March 2011
PDF: 13 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 797320 (22 March 2011); doi: 10.1117/12.879441
Show Author Affiliations
Jue-Chin Yu, National Chiao Tung Univ. (Taiwan)
Peichen Yu, National Chiao Tung Univ. (Taiwan)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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