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Proceedings Paper

High-order dose and focus correction for improved CD uniformity
Author(s): John C. Robinson; Pavel Izikson; Yuji Koyanagi; Tsuyoshi Toki; Junichi Kosugi; Tomoharu Fujiwara; Akira Tokui
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Date Published:
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Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 797125; doi: 10.1117/12.879437
Show Author Affiliations
John C. Robinson, KLA-Tencor Corp. (United States)
Pavel Izikson, KLA-Tencor Corp. (United States)
Yuji Koyanagi, KLA-Tencor Corp. (United States)
Tsuyoshi Toki, Nikon Corp. (Japan)
Junichi Kosugi, Nikon Corp. (Japan)
Tomoharu Fujiwara, Nikon Corp. (Japan)
Akira Tokui, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 7971:
Metrology, Inspection, and Process Control for Microlithography XXV
Christopher J. Raymond, Editor(s)

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