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Proceedings Paper

A study of source mask optimization for logic device through experiment and simulations
Author(s): Hyo-chan Kim; Jeong-Hoon Lee; Jong-Chan Shin; Yong-Kug Bae; Siyoung Choi; Ho-Kyu Kang
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Paper Abstract

Source and Mask co-Optimization (SMO) plays an increasingly important role in the advanced RETs required to continue shrinking designs in the low-k1 lithography regime. Instead of costly double pattering patterning techniques, SMO has been explored as an enabling technology for low-k1 design node. It is clear that intensive optimization of the fundamental degrees of freedom in the optical system allows for the creation of non-intuitive solutions in both the mask and the source, which leads to improved lithographic performance. In this work, source and mask shape for logic device have been optimized in order to improve process window of critical layouts which include complex 2D shape and dense contact. Tachyon SMO solution developed by BRION was introduced to obtain the optimization. In order to improve the accuracy of SMO model, AI blur which represents resist effect on wafer was considered during optimization. Based on simulation results, improvement in terms of process window as well as Mask Error Enhancement Factor (MEEF) was approximately 20 % in comparison with reference conditions. However, the corresponding experimental results should be investigated as the evidence of the performance SMO. These results demonstrate the importance of these considerations during optimization in achieving the best possible SMO results which can be applied successfully to the targeted lithography process.

Paper Details

Date Published: 5 April 2011
PDF: 10 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79731E (5 April 2011); doi: 10.1117/12.879429
Show Author Affiliations
Hyo-chan Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jeong-Hoon Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jong-Chan Shin, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Yong-Kug Bae, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Siyoung Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Ho-Kyu Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)

Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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