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Proceedings Paper

AIMS EUV: the actinic aerial image review platform for EUV masks
Author(s): Dirk Hellweg; Johannes Ruoff; Alois Herkommer; Joachim Stühler; Thomas Ihl; Heiko Feldmann; Michael Ringel; Ulrich Strößner; Sascha Perlitz; Wolfgang Harnisch
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Paper Abstract

EUV mask infrastructure is of key importance for the introduction of the 13.5nm extreme ultraviolet (EUV) wavelength into volume production. In particular, the manufacturing of defect free masks is essential and requires a printability analysis ("review") of potential defect sites. For this purpose, Carl Zeiss and the SEMATECH EUVL Mask Infrastructure consortium have performed a concept and feasibility study for an actinic aerial image metrology system (AIMS™). In this paper, we discuss the main results of this study. We explain the system concept, discuss the expected performance and show simulations of the capability to find minimum sized defects. We demonstrate that our EUV AIMS concept is technically feasible and supports the defect review requirements for the 22nm and 16nm half-pitch (hp) node.

Paper Details

Date Published: 5 April 2011
PDF: 10 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79690H (5 April 2011); doi: 10.1117/12.879422
Show Author Affiliations
Dirk Hellweg, Carl Zeiss SMT GmbH (Germany)
Johannes Ruoff, Carl Zeiss SMT GmbH (Germany)
Alois Herkommer, Carl Zeiss SMT GmbH (Germany)
Joachim Stühler, Carl Zeiss SMT GmbH (Germany)
Thomas Ihl, Carl Zeiss SMT GmbH (Germany)
Heiko Feldmann, Carl Zeiss SMT GmbH (Germany)
Michael Ringel, Carl Zeiss SMT GmbH (Germany)
Ulrich Strößner, Carl Zeiss SMS GmbH (Germany)
Sascha Perlitz, Carl Zeiss SMS GmbH (Germany)
Wolfgang Harnisch, Carl Zeiss SMS GmbH (Germany)


Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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