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Proceedings Paper

Primary structure control of ArF resist polymer by regulating feed rate of monomers and initiator
Author(s): Tomoya Oshikiri; Atsushi Yasuda; Keisuke Kato; Shin-ichi Maeda
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Paper Abstract

For a purpose of decreasing a defect risk, a primary structure of a polymer such as molecular weight, composition of comonomer and its sequence plays significantly important roll. Concerning to a typical radical polymerization, molecular weight and composition are controllable by regulating feed rate of initiator and monomers. At first, a simulation program predicting the radical polymerization was constructed. Then, the conventional polymerization procedure was modified by simulation to give the ideal primary structure. After that, the optimized procedure was verified by an actual experiment. The obtained homogeneous polymer showed good lithographic performance. In addition, a direct observation of the developed surface was achieved by scanning probe microscopy.

Paper Details

Date Published: 15 April 2011
PDF: 10 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79721U (15 April 2011); doi: 10.1117/12.879421
Show Author Affiliations
Tomoya Oshikiri, Mitsubishi Rayon Co., Ltd. (Japan)
Atsushi Yasuda, Mitsubishi Rayon Co., Ltd. (Japan)
Keisuke Kato, Mitsubishi Rayon Co., Ltd. (Japan)
Shin-ichi Maeda, Mitsubishi Rayon Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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