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Proceedings Paper

Study of the three-dimensional shape measurement for mask patterns using Multiple Detector CD-SEM
Author(s): Isao Yonekura; Hidemitsu Hakii; Masashi Kawashita; Yasushi Nishiyama; Keishi Tanaka; Yasutaka Kikuchi; Tsutomu Murakawa; Soichi Shida; Masayuki Kuribara; Toshimichi Iwai; Jun Matsumoto; Takayuki Nakamura
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Paper Abstract

The Multiple Detector CD-SEM acquires the secondary electron from pattern surface at each detector. The 3D shape and height of mask patterns are generated by adding or subtracting signal profile of each detector. In signal profile of the differential image formed in difference between left and right detector signal, including concavo-convex information of mask patterns. Therefore, the 3D shape of mask patterns can be obtained by integrating differential signal profile. This time, we found that proportional relation between pattern height and shadow length on one side of pattern edge. In this paper, we will report experimental results of pattern height measurement. The accuracy of measurement and side wall angle dependency are studied. The proposal method is applied to OMOG masks.

Paper Details

Date Published: 20 April 2011
PDF: 12 pages
Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 797121 (20 April 2011); doi: 10.1117/12.879400
Show Author Affiliations
Isao Yonekura, Toppan Printing Co., Ltd. (Japan)
Hidemitsu Hakii, Toppan Printing Co., Ltd. (Japan)
Masashi Kawashita, Toppan Printing Co., Ltd. (Japan)
Yasushi Nishiyama, Toppan Printing Co., Ltd. (Japan)
Keishi Tanaka, Toppan Printing Co., Ltd. (Japan)
Yasutaka Kikuchi, Toppan Printing Co., Ltd. (Japan)
Tsutomu Murakawa, Advantest Corp. (Japan)
Soichi Shida, Advantest Corp. (Japan)
Masayuki Kuribara, Advantest Corp. (Japan)
Toshimichi Iwai, Advantest Corp. (Japan)
Jun Matsumoto, Advantest Corp. (Japan)
Takayuki Nakamura, Advantest Corp. (Japan)

Published in SPIE Proceedings Vol. 7971:
Metrology, Inspection, and Process Control for Microlithography XXV
Christopher J. Raymond, Editor(s)

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