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Proceedings Paper

Regeneration of imprint molds using vacuum ultraviolet light
Author(s): Masashi Nakao; Masanori Yamaguchi; Shintaro Yabu
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Paper Abstract

Etching characteristics of various resins by a vacuum ultraviolet (VUV, λ=172 nm) light have been examined under conditions of exposure time, substrate temperature, radiation distance and ambient oxygen concentration. The VUV light have used to clean the imprinted molds which are contaminated by organic substances such as ultraviolet-resins through many times of imprinting processes, and it has revealed that the VUV light has effectively regenerated the contaminated molds manufactured by quartz, silicon-carbide and nickel.

Paper Details

Date Published: 16 April 2011
PDF: 6 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79722M (16 April 2011); doi: 10.1117/12.879397
Show Author Affiliations
Masashi Nakao, National Institute of Information and Communications Technology (Japan)
Masanori Yamaguchi, Ushio Inc. (Japan)
Shintaro Yabu, Ushio Inc. (Japan)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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