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Proceedings Paper

High volume manufacturing capability of negative tone development process
Author(s): Shinji Tarutani; Sou Kamimura; Kana Fujii; Keita Katou; Yuuichirou Enomoto
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Paper Abstract

High volume manufacturing capability of negative tone development (NTD) process were discussed in viewpoint of lithography performance, necessary developing time impacting throughput, pattern defectivity, and CD-uniformity (CDU). Dense C/H pattern lithographic performances of the latest resist materials dedicated NTD process were introduced, and the design strategy of these resists were discussed. Best condition of development time was fixed with the study on development time dependences on CD-uniformity and defectivity. Throughput performance of NTD was discussed with the necessary development time. Pattern defectivity studies and CDU studies were carried out on L/S pattern and C/H pattern.

Paper Details

Date Published: 16 April 2011
PDF: 8 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79720N (16 April 2011); doi: 10.1117/12.879391
Show Author Affiliations
Shinji Tarutani, FUJIFILM Corp. (Japan)
Sou Kamimura, FUJIFILM Corp. (Japan)
Kana Fujii, FUJIFILM Corp. (Japan)
Keita Katou, FUJIFILM Corp. (Japan)
Yuuichirou Enomoto, FUJIFILM Corp. (Japan)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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