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Proceedings Paper

Wafer-level fabrication of distributed feedback laser diodes by utilizing UV nanoimprint lithography
Author(s): Masaki Yanagisawa; Yukihiro Tsuji; Hiroyuki Yoshinaga; Naoya Kouno; Kenji Hiratsuka
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Paper Abstract

The authors have succeeded in employing nanoimprint lithography (NIL) to form diffraction gratings of distributed feedback laser diodes (DFB LDs) used in optical communication. We have fabricated more than 300 phase-shifted DFB LDs on a 2-in. InP substrate. The devices have indicated comparable characteristics including uniformity and reliability with those fabricated by conventional electron beam lithography. We have also demonstrated a novel concept of a mold containing various types of grating patterns in a field ("VARI-mold"). By utilizing the new mold, DFB LDs with various emission wavelengths are formed simultaneously on a wafer. It indicates that one VARI-mold is possible to be applied to various kinds of product, leading to the cost reduction of the molds and the total NIL process. The results of this study indicate that NIL is a promising candidate of the production technique for phase-shifted DFB LDs featuring low cost and high throughput.

Paper Details

Date Published: 4 April 2011
PDF: 8 pages
Proc. SPIE 7970, Alternative Lithographic Technologies III, 797014 (4 April 2011); doi: 10.1117/12.879367
Show Author Affiliations
Masaki Yanagisawa, Sumitomo Electric Industries, Ltd. (Japan)
Yukihiro Tsuji, Sumitomo Electric Industries, Ltd. (Japan)
Hiroyuki Yoshinaga, Sumitomo Electric Industries, Ltd. (Japan)
Naoya Kouno, Sumitomo Electric Industries, Ltd. (Japan)
Kenji Hiratsuka, Sumitomo Electric Industries, Ltd. (Japan)


Published in SPIE Proceedings Vol. 7970:
Alternative Lithographic Technologies III
Daniel J. C. Herr, Editor(s)

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