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Proceedings Paper

Deprotonation mechanism of poly(styrene-acrylate)-based chemically amplified resist
Author(s): Y. Tajima; K. Okamoto; T. Kozawa; S. Tagawa; R. Fujiyoshi; T. Sumiyoshi
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Paper Abstract

The influence of degree of copolymerization of poly(styrene-ran-methyl methacrylate) [P(S-MMA)] on the deprotonation mechanism for EUV chemically amplified resists were investigated by pulse radiolysis, quantity of the acid yield, and density functional theory methods. The degradation of MMA unit occurs immediately before the hole transfer to the styrene unit in P(S-MMA) in the low PS mole fraction (< 50 %). The hole transfer from MMA unit to styrene units occurred in the high PS mole fraction (> 70 %). It is assumed that the formation of styrene multimer (n > 3) causes the hole transfer.

Paper Details

Date Published: 16 April 2011
PDF: 7 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79721N (16 April 2011); doi: 10.1117/12.879362
Show Author Affiliations
Y. Tajima, Hokkaido Univ. (Japan)
K. Okamoto, Hokkaido Univ. (Japan)
Japan Science and Technology Agency, CREST (Japan)
T. Kozawa, Japan Science and Technology Agency, CREST (Japan)
Osaka Univ. (Japan)
S. Tagawa, Japan Science and Technology Agency, CREST (Japan)
Osaka Univ. (Japan)
R. Fujiyoshi, Hokkaido Univ. (Japan)
T. Sumiyoshi, Hokkaido Univ. (Japan)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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