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Proceedings Paper

Characteristics of main chain decomposable STAR polymer for EUV resist
Author(s): Jun Iwashita; Taku Hirayama; Isamu Takagi; Kensuke Matsuzawa; Kenta Suzuki; Sachiko Yoshizawa; Kenri Konno; Masahito Yahagi; Kazufumi Sato; Seiichi Tagawa; Kazuyuki Enomoto; Akihiro Oshima
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Paper Abstract

The concept of nonlinear acid diffusion coefficient would be emphasized to achieve better latent image quality, resulting in better lithographic performance. Focusing on realizing the concept, we previously reported about a main chain decomposable star shaped polymer (STAR polymer).STAR polymer consists of a core unit and several arm units which connect to the core unit with easily acid cleavable bonding. (Fig.1) The main chain decomposition system is ideal to achieve promoted acid diffusion at exposed area because it accompanies great molecular weight reduction at exposed area. The significance of the STAR system had been confirmed for partially protected poly(p-hydroxystyrene) (PHS) considering arm length and core structure. Employing p-hydroxy-α-methylstylene (PHOMS) for arm structure, novel STAR polymer with appropriate glass transition temperature (Tg) could be realized. (Fig.2) Poly PHOMS is known to undergo acid-catalyzed decomposition from the polymer end. Lithographic performance comparison between the STAR polymer and the linear polymer as a control using a Micro Exposure Tool (MET) would be exhibited. Thermal property change with exposure and dissolution charactersitic will be also discussed. Moreover main chain decomposition mechanism was investigated with flood EB irradiation.

Paper Details

Date Published: 15 April 2011
PDF: 10 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79720L (15 April 2011); doi: 10.1117/12.879349
Show Author Affiliations
Jun Iwashita, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Taku Hirayama, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Isamu Takagi, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Kensuke Matsuzawa, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Kenta Suzuki, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Sachiko Yoshizawa, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Kenri Konno, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Masahito Yahagi, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Kazufumi Sato, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)
Kazuyuki Enomoto, Osaka Univ. (Japan)
Akihiro Oshima, Osaka Univ. (Japan)

Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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