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Proceedings Paper

Interaction of benzene and toluene vapors with Ru(0001) surface: relevance to MLM contamination
Author(s): B. V. Yakshinskiy; Q. Shen; R. A. Bartynski
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Paper Abstract

We report studies of the thermal and non-thermal interaction of benzene and toluene vapors with the Ru(0001) surface, a model cap layer for multilayer mirrors (MLM), using temperature programmed desorption (TPD), X-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), electron stimulated desorption (ESD), low electron energy diffraction (LEED), and scanning tunneling microscopy (STM). A low energy electron source (100 eV) is used to simulate radiation damage on the surface produced by EUV photons. Heating of adsorbed hydrocarbons leads to a stepwise dehydrogenation and buildup a self-limited carbon monolayer. Graphene monolayer and bilayer formation on Ru by hydrocarbon pyrolysis or by carbon segregation from the sample bulk is examined as a possible way to reduce the surface contamination rate. The binding energy of the hydrocarbon molecule is found to be smaller on a graphene layer than on disordered carbon. Electron bombardment of both bare and graphene covered Ru surface in the presence of benzene and toluene leads to C-buildup. However, the presence of a graphene monolayer on Ru surface reduces the electron-induced carbon growth rate at low electron flux conditions.

Paper Details

Date Published: 8 April 2011
PDF: 10 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 796922 (8 April 2011); doi: 10.1117/12.879297
Show Author Affiliations
B. V. Yakshinskiy, Rutgers, The State Univ. of New Jersey (United States)
Q. Shen, Rutgers, The State Univ. of New Jersey (United States)
R. A. Bartynski, Rutgers, The State Univ. of New Jersey (United States)


Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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