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Proceedings Paper

Fast algorithm for quadratic aberration model based on cross triple correlation
Author(s): Wei Liu; Tingting Zhou; Shiyuan Liu
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Paper Abstract

The quadratic aberration model used in optical lithography is a natural extension of the linear model by taking into account interactions among individual Zernike coefficients. Although the model has been tested and verified in many applications, the effects of Zernike coefficients under partially coherent imaging are usually obtained by extensive experiments due to complexity of the model expression. In this paper, a generalized cross triple correlation (CTC) is introduced, and a fast algorithm to simulate the quadratic aberration model is developed. Simulations were performed by the proposed CTC based algorithm with different input Zernike aberrations for binary and phase shift masks with multiple pitches and orientations, which demonstrate that the proposed approach is not only accurate but also efficient for revealing the influence of different Zernike orders on aerial image intensity distributions under partially coherent illumination.

Paper Details

Date Published: 22 March 2011
PDF: 9 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 79731M (22 March 2011); doi: 10.1117/12.879217
Show Author Affiliations
Wei Liu, Huazhong Univ. of Science and Technology (China)
Tingting Zhou, Huazhong Univ. of Science and Technology (China)
Shiyuan Liu, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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