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Proceedings Paper

Compensation of mask induced aberrations by projector wavefront control
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Paper Abstract

Rigorous simulation of light diffraction from optical and EUV masks predicts phase effects with an aberration like impact on the imaging performance of lithographic projection systems. This paper demonstrates the application of advanced modeling and optimization methods for the compensation of mask induced aberration effects. It is shown that proper adjustment of the wavefront results in significant reduction of best focus differences between different features.

Paper Details

Date Published: 22 March 2011
PDF: 8 pages
Proc. SPIE 7973, Optical Microlithography XXIV, 797329 (22 March 2011); doi: 10.1117/12.879207
Show Author Affiliations
Peter Evanschitzky, Fraunhofer-Institut für Integrierte System und Bauelementetechnologie (Germany)
Feng Shao, Fraunhofer-Institut für Integrierte System und Bauelementetechnologie (Germany)
Erlangen Graduate School of Advanced Optical Technologies (Germany)
Tim Fühner, Fraunhofer-Institut für Integrierte System und Bauelementetechnologie (Germany)
Andreas Erdmann, Fraunhofer-Institut für Integrierte System und Bauelementetechnologie (Germany)
Erlangen Graduate School of Advanced Optical Technologies (Germany)


Published in SPIE Proceedings Vol. 7973:
Optical Microlithography XXIV
Mircea V. Dusa, Editor(s)

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