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Proceedings Paper

Analysis of the generating action of the acid from PAG using acid sensitive dyes
Author(s): Atsushi Sekiguchi; Yoko Matsumoto; Hiroko Konishi; Kengo Moriyasu; Yukihiro Morimoto
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Paper Abstract

The use of acid sensitive dyes to determine the quantity of acid generated from PAG and in the analysis of acid-generating reaction is currently being studied. The method would allow an easy understanding of the PAG acid-generating reaction simply by adding an acid sensitive dye to the resist. In the conventional method, a resist containing a chromogenic substance is applied to a quartz substrate, which is then exposed. Following the exposure, the absorbance of chromogenic component near 530 nm is measured and evaluated with a spectroscope. The rate constant for acid generation (Dill's C parameter) during the exposure is determined based on the relationship between transmittance at 530 nm and the exposure dose. However, the chromogenic substance used in this method degrades over time (fading reaction) after the exposure, resulting in variations in transmittance measurements due to the effects of time between the completion of the exposure and the measurement of transmittance. We devised a prototype instrument capable of in situ measurements of absorbance at 530 nm while irradiating a 193-nm light beam. Using this instrument, we obtained rate constants for acid generation (Dill's C parameter) and examined the differing results obtained with ArF resist polymers of differing PAG concentrations and structures as well as dependence on the quantity of the chromogenic substance.

Paper Details

Date Published: 16 April 2011
PDF: 12 pages
Proc. SPIE 7972, Advances in Resist Materials and Processing Technology XXVIII, 79721S (16 April 2011); doi: 10.1117/12.879199
Show Author Affiliations
Atsushi Sekiguchi, Litho Tech Japan Corp. (Japan)
Yoko Matsumoto, Litho Tech Japan Corp. (Japan)
Hiroko Konishi, Litho Tech Japan Corp. (Japan)
Kengo Moriyasu, Ushio Inc. (Japan)
Yukihiro Morimoto, Ushio Inc. (Japan)


Published in SPIE Proceedings Vol. 7972:
Advances in Resist Materials and Processing Technology XXVIII
Robert D. Allen; Mark H. Somervell, Editor(s)

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