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Proceedings Paper

Characterization and optimization of tin particle mitigation and EUV conversion efficiency in a laser produced plasma EUV light source
Author(s): Tatsuya Yanagida; Hitoshi Nagano; Yasunori Wada; Takayuki Yabu; Shinji Nagai; Georg Soumagne; Tsukasa Hori; Kouji Kakizaki; Akira Sumitani; Junichi Fujimoto; Hakaru Mizoguchi; Akira Endo
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Paper Abstract

A laser produced plasma (LPP) extreme ultraviolet (EUV) light source of 13.5 nm has been developed for next generation lithography. Sn plasma is an efficient generator of 13.5 nm EUV light. On the other hand, deposition of Sn particles which strongly affects EUV collector mirror lifetime is a critical issue for long-term stable operation of the high-power EUV light source. In this paper we describe about the optimization of tin debris mitigation with a compact EUV generation system. We observe almost all of Sn fragments generated after a pre-pulse irradiation are vaporized by a main CO2 pulse laser with a droplet of 20 μm in diameter. An EUV conversion efficiency (CE) of 3.4% at a maximum is obtained for the 20 μm droplet. These results indicate the debris mitigation can be achieved without degradation of the high EUV CE.

Paper Details

Date Published: 8 April 2011
PDF: 10 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692T (8 April 2011); doi: 10.1117/12.879189
Show Author Affiliations
Tatsuya Yanagida, Komatsu Ltd. (Japan)
Hitoshi Nagano, Komatsu Ltd. (Japan)
Yasunori Wada, EUVA (Japan)
Takayuki Yabu, EUVA (Japan)
Shinji Nagai, EUVA (Japan)
Georg Soumagne, EUVA (Japan)
Tsukasa Hori, EUVA (Japan)
Kouji Kakizaki, Komatsu Ltd. (Japan)
Akira Sumitani, EUVA (Japan)
Junichi Fujimoto, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
Akira Endo, Forschungszentrum Dresden-Rossendorf e.V. (Germany)


Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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