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Proceedings Paper

Development of the reliable 20 kW class pulsed carbon dioxide laser system for LPP EUV light source
Author(s): Junichi Fujimoto; Takeshi Ohta; Krzysztof M. Nowak; Takashi Suganuma; Hidenobu Kameda; Masato Moriya; Toshio Yokoduka; Koji Fujitaka; Akira Sumitani; Hakaru Mizoguchi
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Paper Abstract

Laser Produced Plasma (LPP) Extreme Ultra Violet (EUV) light source is expected to be used for next generation lithography. To realize such performance for industrial use, the main driver laser is one of the key components. Our source uses a high power pulsed carbon dioxide (CO2) laser as a plasma driver. A master oscillator and a power amplifier (MOPA) system based on a new configuration of an RF-excited CO2 laser is the key to high efficiency. This pulsed CO2 laser system has started to operate. This report shows its initial performance. Also for a reliable industrial system, the optical instability caused by vibration and thermal distortion of optics should be suppressed at 20 kW output level. The primary design of key modules, such as mirrors, for the CO2 laser, and dynamic design concepts are shown in this report. We have achieved 7.6 kW, 14 nsec, 100 kHz pulsed output in this configuration.

Paper Details

Date Published: 8 April 2011
PDF: 11 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692S (8 April 2011); doi: 10.1117/12.879181
Show Author Affiliations
Junichi Fujimoto, Gigaphoton Inc. (Japan)
Takeshi Ohta, Komatsu Ltd. (Japan)
Krzysztof M. Nowak, Komatsu Ltd. (Japan)
Takashi Suganuma, Komatsu Ltd. (Japan)
Hidenobu Kameda, Komatsu Ltd. (Japan)
Masato Moriya, Komatsu Ltd. (Japan)
Toshio Yokoduka, Komatsu Ltd. (Japan)
Koji Fujitaka, Komatsu Ltd. (Japan)
Akira Sumitani, EUVA/Komatsu Ltd. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)


Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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