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Proceedings Paper

Counter-facing plasma focus system as an efficient and long-pulse EUV light source
Author(s): H. Kuwabara; K. Hayashi; Y. Kuroda; H. Nose; K. Hotozuka; M. Nakajima; K. Horioka
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Paper Abstract

A plasma focus system composed of a pair of counter-facing coaxial plasma guns is proposed as a long-pulse and efficient EUV light source. A proof-of-concept experiment demonstrated that with an assist of breakdown and outer electrode connections, current sheets evolved into a configuration for stable plasma confinement at the center of the electrode. The current sheets could successively compress and confine the high energy density plasma every half period of the discharge current, enabling highly repetitive light emissions in extreme ultraviolet region with time duration in at least ten microseconds for Xe plasma. Also, we confirmed operations of our system for Li plasma. We estimated the highest EUV energy in Li plasma operation at 93mJ/4π sr per 2% bandwidth per pulse.

Paper Details

Date Published: 8 April 2011
PDF: 8 pages
Proc. SPIE 7969, Extreme Ultraviolet (EUV) Lithography II, 79692R (8 April 2011); doi: 10.1117/12.879140
Show Author Affiliations
H. Kuwabara, IHI Corp. (Japan)
K. Hayashi, Tokyo Institute of Technology (Japan)
Y. Kuroda, Tokyo Institute of Technology (Japan)
H. Nose, IHI Corp. (Japan)
K. Hotozuka, IHI Corp. (Japan)
M. Nakajima, Tokyo Institute of Technology (Japan)
K. Horioka, Tokyo Institute of Technology (Japan)

Published in SPIE Proceedings Vol. 7969:
Extreme Ultraviolet (EUV) Lithography II
Bruno M. La Fontaine; Patrick P. Naulleau, Editor(s)

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