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Proceedings Paper

Microlithography application for production of multilevel diffractive optical elements (as a security hologram feature)
Author(s): Eugene Braginets; V. Kurashov; S. Honcharuk; V. Girnyk; S. Kostyukevych; K. Kostyukevych
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Paper Abstract

The goal of a present research is to develop a method for production of multilevel Diffractive Optical Elements (DOEs) for use in Digital Security Holograms, using the direct-writing maskless lithography system.

Paper Details

Date Published: 15 February 2011
PDF: 8 pages
Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 79271B (15 February 2011); doi: 10.1117/12.879056
Show Author Affiliations
Eugene Braginets, Kievgolografia Ltd. (Ukraine)
Taras Shevchenko National Univ. of Kyiv (Ukraine)
V. Kurashov, Taras Shevchenko National Univ. of Kyiv (Ukraine)
S. Honcharuk, Kievgolografia Ltd. (Ukraine)
V. Girnyk, Kievgolografia Ltd. (Ukraine)
S. Kostyukevych, V. Lashkaryov Institute of Semiconductor Physics (Ukraine)
K. Kostyukevych, V. Lashkaryov Institute of Semiconductor Physics (Ukraine)


Published in SPIE Proceedings Vol. 7927:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)

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