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Proceedings Paper

Selective inhibition of polymerization enables sub-diffraction optical lithography
Author(s): Benjamin Harke; Paolo Bianchini; Fraz Anjum; Fernando Brandi; Alberto Diaspro
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Paper Abstract

We show that after two-photon excitation of the photo initiator we are able to inhibit the polymerization process with a second beam of different wavelength. For achieving sub-diffraction resolution this is one of the key elements. Remarkably is that these experiments can be performed with a commercially available STED microscope slightly modified for two-photon-excitation (TPE). First experiments featuring an enhanced resolution will be presented.

Paper Details

Date Published: 8 February 2011
PDF: 5 pages
Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 792709 (8 February 2011); doi: 10.1117/12.878961
Show Author Affiliations
Benjamin Harke, Istituto Italiano di Tecnologia (Italy)
Paolo Bianchini, Istituto Italiano di Tecnologia (Italy)
Univ. degli Studi di Genova (Italy)
Fraz Anjum, Istituto Italiano di Tecnologia (Italy)
Fernando Brandi, Istituto Italiano di Tecnologia (Italy)
Alberto Diaspro, Istituto Italiano di Tecnologia (Italy)
Univ. degli Studi di Genova (Italy)


Published in SPIE Proceedings Vol. 7927:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)

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