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Proceedings Paper

A CD-gap-free contour extraction technique for OPC model calibration
Author(s): T. Shibahara; T. Minakawa; M. Oikawa; H. Shindo; H. Sugahara; Y. Hojyo
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Paper Abstract

Recently, optical proximity correction model calibration techniques that use SEM contours have enabled possibly significant improvements in complex mask design. However, compared to conventional CD-based calibration, contour-based calibration results in increased errors in 1D features. In fact, our research shows that there is a ~1-nm gap, which we call "CD-gap," between CD measurements directly calculated from a SEM image and CD measurements calculated from SEM contours. To achieve accurate calibration, SEM contours must match the corresponding CD measurements. We have developed a CD-gap-free contour extraction technique in response to this problem. In our technique, a mask edge is classified into shape structures and an optimized SEM contour extraction method is prepared for each shape structure to reduce the CD-gap. Experimental results show that the CD-gap can be decreased to sub-nm, which clearly demonstrates the potential of our proposed technique to play a vital role in the lithography process.

Paper Details

Date Published: 20 April 2011
PDF: 8 pages
Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79710O (20 April 2011); doi: 10.1117/12.878583
Show Author Affiliations
T. Shibahara, Hitachi, Ltd. (Japan)
T. Minakawa, Hitachi, Ltd. (Japan)
M. Oikawa, Hitachi, Ltd. (Japan)
H. Shindo, Hitachi High-Technologies Corp. (Japan)
H. Sugahara, Hitachi High-Technologies Corp. (Japan)
Y. Hojyo, Hitachi High-Technologies Corp. (Japan)


Published in SPIE Proceedings Vol. 7971:
Metrology, Inspection, and Process Control for Microlithography XXV
Christopher J. Raymond, Editor(s)

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