Share Email Print
cover

Proceedings Paper

In situ surface topography measurement of MOEMS structures under laser exposure
Author(s): Alexander Mai; Mathias Krellmann; Steffen Sinning; Steffen Wolschke; Ulrike Dauderstädt; Harald Schenk; Dieter Schmeißer; Michael Wagner
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Spatial light modulators (SLM) developed at the Fraunhofer Institute for Photonic Microsystems (Fraunhofer IPMS) are based on arrays of tiltable micro mirrors on a semiconductor chip. Development and optimization of such complex micro- opto-electro-mechanical systems (MOEMS) require detailed knowledge of the device behaviour under application specific operating conditions. In this context, the need for a high resolution surface topography measurement under laser exposure (in situ) was identified, complementing ex situ characterizations where laser exposure and micro-mirror topography measurements are carried out sequentially. For this purpose an interferometric setup using the phase-shift principle was designed and is presented in this paper. For setup verification SLMs were irradiated at 248 nm (KrF) with energy densities of up to 10 mJ/cm2. In general, the setup is neither limited to a specific illumination wavelength nor to micromirrors as structures under test. Influences of different illumination parameters such as energy density, laser repetition rate etc. on the mirror topography can be studied in detail. Results obtained so far reveal valuable feedback for further technological optimization of mirror array devices.

Paper Details

Date Published: 14 February 2011
PDF: 7 pages
Proc. SPIE 7930, MOEMS and Miniaturized Systems X, 793010 (14 February 2011); doi: 10.1117/12.877062
Show Author Affiliations
Alexander Mai, Fraunhofer Institute for Photonic Microsystems (Germany)
Mathias Krellmann, Fraunhofer Institute for Photonic Microsystems (Germany)
Steffen Sinning, Fraunhofer Institute for Photonic Microsystems (Germany)
Steffen Wolschke, Fraunhofer Institute for Photonic Microsystems (Germany)
Ulrike Dauderstädt, Fraunhofer Institute for Photonic Microsystems (Germany)
Harald Schenk, Fraunhofer Institute for Photonic Microsystems (Germany)
Dieter Schmeißer, Brandenburgische Technische Univ. Cottbus (Germany)
Michael Wagner, Fraunhofer Institute for Photonic Microsystems (Germany)


Published in SPIE Proceedings Vol. 7930:
MOEMS and Miniaturized Systems X
Harald Schenk; Wibool Piyawattanametha, Editor(s)

© SPIE. Terms of Use
Back to Top