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Proceedings Paper

Wavefront measurement for EUV lithography system through Hartmann sensor
Author(s): A. Polo; F. Bociort; S. F. Pereira; H. P. Urbach
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Paper Abstract

Accurate wavefront aberration measurement are essential for next-generation Extreme Ultraviolet (EUV) Lithography. During the past years several accurate interferometric techniques have been developed, but these techniques have limitation. In this work we discuss a different technique based on the Hartmann Wavefront Sensor that requires no interferometry. We present a mathematical model of this system and describe our experimental setup which demonstrates the feasibility and advantages in terms of dynamic range and accuracy compared to interferometric techniques.

Paper Details

Date Published: 20 April 2011
PDF: 7 pages
Proc. SPIE 7971, Metrology, Inspection, and Process Control for Microlithography XXV, 79712R (20 April 2011); doi: 10.1117/12.877044
Show Author Affiliations
A. Polo, Technische Univ. Delft (Netherlands)
F. Bociort, Technische Univ. Delft (Netherlands)
S. F. Pereira, Technische Univ. Delft (Netherlands)
H. P. Urbach, Technische Univ. Delft (Netherlands)


Published in SPIE Proceedings Vol. 7971:
Metrology, Inspection, and Process Control for Microlithography XXV
Christopher J. Raymond, Editor(s)

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