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Proceedings Paper

DWDM DFB LD fabricated by nanoimprint process
Author(s): Wen Liu; Lei Wang; Ning Zhou; Yiwen Zhang; Fei Qiu; Zhimou Xu
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Paper Abstract

DFB LDs are key components in DWDM optical network. Now they are very expensive because the feedback grating period has to be controlled with very high accuracy and EBL is currently the most popular solution. We propose a high throughput, low cost NIL process based on a large stamp fabricated by SFIL and soft stamp pattern transfer method. DFB chips on 30mm*30mm area were manufactured with both good uniformity and performance. 13 ITU channels from 1540nm to 1560nm of 200GHz space are made. Our results show NIL has high potential to become another popular technology for DFB LD production, this cost effective and high efficiency manufacture solution may yield a significant impact to the future optical communication industry development.

Paper Details

Date Published: 14 February 2011
PDF: 8 pages
Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 79270W (14 February 2011); doi: 10.1117/12.876774
Show Author Affiliations
Wen Liu, Huazhong Univ. of Science and Technology (China)
Lei Wang, Huazhong Univ. of Science and Technology (China)
Ning Zhou, Accelink Technologies Co., Ltd. (China)
Yiwen Zhang, Huazhong Univ. of Science and Technology (China)
Fei Qiu, Huazhong Univ. of Science and Technology (China)
Zhimou Xu, Huazhong Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 7927:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)

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