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Proceedings Paper

Characterization of MEMS FTIR spectrometer
Author(s): Diaa Khalil; Yasser Sabry; Haitham Omran; Mostafa Medhat; Amr Hafez; Bassam Saadany
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Paper Abstract

In this work we present the full characterization of an optical MEMS Fourier Transform Infra Red FTIR spectrometer fabricated by Deep Reactive Ion Etching DRIE Technology on Silicon substrate. Both electrical and optical properties of the spectrometer are measured. The presented techniques allows to build an engineering model for the spectrometer and to predict its main specifications taking into account the specificity of the MEMS technology used in the spectrometer fabrication.

Paper Details

Date Published: 14 February 2011
PDF: 10 pages
Proc. SPIE 7930, MOEMS and Miniaturized Systems X, 79300J (14 February 2011); doi: 10.1117/12.876124
Show Author Affiliations
Diaa Khalil, Ain Shams Univ. (Egypt)
Si-Ware Systems (Egypt)
Yasser Sabry, Ain Shams Univ. (Egypt)
Si-Ware Systems (Egypt)
Haitham Omran, Si-Ware Systems (Egypt)
Mostafa Medhat, Si-Ware Systems (Egypt)
Amr Hafez, Si-Ware Systems (Egypt)
Bassam Saadany, Si-Ware Systems (Egypt)


Published in SPIE Proceedings Vol. 7930:
MOEMS and Miniaturized Systems X
Harald Schenk; Wibool Piyawattanametha, Editor(s)

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