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Proceedings Paper

Multiphoton lithography and ITO structuring by high repetition-rate sub-15 femtosecond laser pulses
Author(s): Maziar Afshar; Somaie Saremi; Henning Völlm; Dara Feili; Helmut Seidel; Martin Straub; H. Zhang; Karsten König
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Paper Abstract

We report on experiments using a near-infrared Ti:Sapphire laser system based on a 85 MHz, sub-15 fs resonator. In the negative photoresist SU-8 multiphoton polymerization of 3D structures resulted in a minimum line width of approximately 80 nm at aspect ratios in excess of 50:1. The second part of our contribution deals with sub-wavelength nanostructuring and laser-annealing of thin indium-tin-oxide (ITO) films. The ablation experiments allowed for the generation of cuts of sub-100 nm width in periodic and single cut arrangements. Annealing resulted in a different phase of ITO which is more resistive against etching in HCl at room temperature. The dependence of cuts on scan parameters that affect the ITO film properties was investigated.

Paper Details

Date Published: 25 February 2011
PDF: 7 pages
Proc. SPIE 7920, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVI, 792015 (25 February 2011); doi: 10.1117/12.875897
Show Author Affiliations
Maziar Afshar, Saarland Univ. (Germany)
Somaie Saremi, Saarland Univ. (Germany)
Henning Völlm, Saarland Univ. (Germany)
Dara Feili, Saarland Univ. (Germany)
Helmut Seidel, Saarland Univ. (Germany)
Martin Straub, Saarland Univ. (Germany)
H. Zhang, Saarland Univ. (Germany)
Karsten König, Saarland Univ. (Germany)


Published in SPIE Proceedings Vol. 7920:
Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XVI
Bo Gu; Guido Hennig; Xianfan Xu; Hiroyuki Niino, Editor(s)

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