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Proceedings Paper

InAlGaN optical emitters: laser diodes with non-epitaxial cladding layers and ultraviolet light-emitting diodes
Author(s): Christopher Chua; Zhihong Yang; Clifford Knollenberg; Mark Teepe; Bowen Cheng; Andre Strittmatter; David Bour; Noble M. Johnson
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Paper Abstract

We describe recent work on InGaN lasers and AlGaN UV LEDs at the Palo Alto Research Center (PARC). The presentation includes results from InGaN laser diodes in which the usual epitaxial upper cladding layer is replaced with an evaporated or sputtered non-epitaxial material, such as indium tin oxide, silver, or a silver-palladium-copper alloy [1, 2]. Non-epitaxial cladding layers offer several advantages to long wavelength InGaN laser diodes, such as eliminating the need to expose vulnerable InGaN active layers to the high temperatures required for growing conventional p-AlGaN cladding layers subsequent to the active layer growth. The presentation also discusses our recent results on AlGaN UV LEDs. UV LEDs with 300 micron square geometries operating at λ = 325 nm exhibit output powers of 13 mW with differential quantum efficiencies of 0.054 W/A measured under wafer-level, unpackaged condition with no heat sink. LEDs operating at λ = 290 nm under similar test conditions display output powers of 1.6 mW for large-area 300 μm X 1 mm devices.

Paper Details

Date Published: 4 March 2011
PDF: 7 pages
Proc. SPIE 7939, Gallium Nitride Materials and Devices VI, 793918 (4 March 2011); doi: 10.1117/12.875188
Show Author Affiliations
Christopher Chua, Palo Alto Research Center, Inc. (United States)
Zhihong Yang, Palo Alto Research Center, Inc. (United States)
Clifford Knollenberg, Palo Alto Research Center, Inc. (United States)
Mark Teepe, Palo Alto Research Center, Inc. (United States)
Bowen Cheng, Palo Alto Research Center, Inc. (United States)
Andre Strittmatter, Palo Alto Research Center, Inc. (United States)
David Bour, Palo Alto Research Center, Inc. (United States)
Noble M. Johnson, Palo Alto Research Center, Inc. (United States)


Published in SPIE Proceedings Vol. 7939:
Gallium Nitride Materials and Devices VI
Jen-Inn Chyi; Yasushi Nanishi; Hadis Morkoç; Joachim Piprek; Euijoon Yoon, Editor(s)

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