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Proceedings Paper

850 nm oxide high speed VCSEL development at Avago
Author(s): Jingyi Wang; Chen Ji; David Soderstrom; Tong Jian; Laura Giovane; Sumon Ray; Zheng-Wen Feng; Friedhelm Hopfer; Jeong-Ki Hwang; Terry Sale; Sumitro Joyo Taslim; Chen Chu
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Paper Abstract

In this paper we will discuss 14 Gb/s 850 nm oxide VCSEL performance and reliability. The device is targeted for the 16G Fibre Channel standard. The 14 Gb/s 850 nm oxide VCSEL meets the standard's specifications over the extended temperature range to support transceiver module operation from 0C to 85C.

Paper Details

Date Published: 7 February 2011
PDF: 6 pages
Proc. SPIE 7952, Vertical-Cavity Surface-Emitting Lasers XV, 795205 (7 February 2011); doi: 10.1117/12.875098
Show Author Affiliations
Jingyi Wang, Avago Technologies (United States)
Chen Ji, Avago Technologies (United States)
David Soderstrom, Avago Technologies (United States)
Tong Jian, Avago Technologies (United States)
Laura Giovane, Avago Technologies (United States)
Sumon Ray, Avago Technologies (Singapore)
Zheng-Wen Feng, Avago Technologies (Singapore)
Friedhelm Hopfer, Avago Technologies (Singapore)
Jeong-Ki Hwang, Avago Technologies (Singapore)
Terry Sale, Avago Technologies (Singapore)
Sumitro Joyo Taslim, Avago Technologies (Singapore)
Chen Chu, Avago Technologies (Singapore)

Published in SPIE Proceedings Vol. 7952:
Vertical-Cavity Surface-Emitting Lasers XV
James K. Guenter; Chun Lei, Editor(s)

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