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Proceedings Paper

Sub-100nm material processing with sub-15 femtosecond picojoule near infrared laser pulses
Author(s): Karsten König; Aisada Uchugonova; Martin Straub; Huijing Zhang; Maziar Afshar; Dara Feili; Helmut Seidel
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Paper Abstract

Ultrabroad band 12 femtosecond near infrared laser pulses at transient TW/cm2 intensities and low picojoule pulse energies (mean powers < 20 mW at 85 MHz repetition rate) have been used to perform material nanoprocessing based on multiphoton ionization and plasma formation. Cut sizes of sub-wavelength, sub-100 nm which is far beyond the Abbe diffraction limit have been realized without any collateral damage effect in silicon wafers, photoresists, glass, polymers, metals, and biological targets. Multiphoton sub-15fs microscopes may become novel non-invasive 3D tools for highly precise nanoprocessing of inorganic and organic targets as well as two-photon 3D imaging.

Paper Details

Date Published: 22 February 2011
PDF: 6 pages
Proc. SPIE 7903, Multiphoton Microscopy in the Biomedical Sciences XI, 79031M (22 February 2011); doi: 10.1117/12.875004
Show Author Affiliations
Karsten König, Saarland Univ. (Germany)
Univ. of California, Irvine (United States)
Aisada Uchugonova, Saarland Univ. (Germany)
Martin Straub, Saarland Univ. (Germany)
Huijing Zhang, Saarland Univ. (Germany)
Maziar Afshar, Saarland Univ. (Germany)
Dara Feili, Saarland Univ. (Germany)
Helmut Seidel, Saarland Univ. (Germany)


Published in SPIE Proceedings Vol. 7903:
Multiphoton Microscopy in the Biomedical Sciences XI
Ammasi Periasamy; Karsten König; Peter T. C. So, Editor(s)

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