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Proceedings Paper

On-chip nanostructures for polarization imaging and multispectral sensing using dedicated layers of modified CMOS processes
Author(s): Stephan Junger; Wladimir Tschekalinskij; Nanko Verwaal; Norbert Weber
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Paper Abstract

Sub-wavelength gratings and hole arrays in metal films are applicable for polarization and spectral selective sensors, respectively. We demonstrate the fabrication of wire grid polarizers using standard complementary metal-oxide semiconductor (CMOS) processes. Extraordinary optical transmission of hole arrays was achieved by using the dedicated layer of a modified CMOS process. The structures were simulated using the finite-difference time-domain (FDTD) method and fabricated using the work flow of integrated circuits. A high-speed polarization image sensor with a pixel size of 6 μm was designed and demonstrated, and multispectral sensing was implemented using nanostructures with different spectral filter performances on a single chip.

Paper Details

Date Published: 1 March 2011
PDF: 7 pages
Proc. SPIE 7946, Photonic and Phononic Properties of Engineered Nanostructures, 79461D (1 March 2011); doi: 10.1117/12.874785
Show Author Affiliations
Stephan Junger, Fraunhofer Institute for Integrated Circuits (Germany)
Wladimir Tschekalinskij, Fraunhofer Institute for Integrated Circuits (Germany)
Nanko Verwaal, Fraunhofer Institute for Integrated Circuits (Germany)
Norbert Weber, Fraunhofer Institute for Integrated Circuits (Germany)


Published in SPIE Proceedings Vol. 7946:
Photonic and Phononic Properties of Engineered Nanostructures
Ali Adibi; Shawn-Yu Lin; Axel Scherer, Editor(s)

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