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Proceedings Paper

Fast online simulation of 3D nanophotonic structures by the reduced basis method
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Paper Abstract

We present algorithmic details and applications of the reduced basis method as efficient Maxwell solver to nanophotonic applications including examples from mask optimization in photolithography and parameter retrieval in inverse problems, e.g., in optical metrology. The reduced basis method is a currently studied approach to the multiple solution of problems depending on a number of geometrical, material and source parameters. Such problems occur frequently in optimization tasks where parameters have to be adjusted in order to minimize some error functionals or in production environments where deviations from ideal structures have to be controlled.

Paper Details

Date Published: 17 January 2011
PDF: 6 pages
Proc. SPIE 7941, Integrated Optics: Devices, Materials, and Technologies XV, 79410G (17 January 2011); doi: 10.1117/12.874726
Show Author Affiliations
Frank Schmidt, Konrad-Zuse-Zentrum für Informationstechnik Berlin (Germany)
JCMwave GmbH (Germany)
Jan Pomplun, Konrad-Zuse-Zentrum für Informationstechnik Berlin (Germany)
JCMwave GmbH (Germany)
Lin Zschiedrich, JCMwave GmbH (Germany)
Sven Burger, Konrad-Zuse-Zentrum für Informationstechnik Berlin (Germany)
JCMwave GmbH (Germany)


Published in SPIE Proceedings Vol. 7941:
Integrated Optics: Devices, Materials, and Technologies XV
Jean Emmanuel Broquin; Gualtiero Nunzi Conti, Editor(s)

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