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Proceedings Paper

Fabrication of ZnO channel waveguides for nonlinear optical applications
Author(s): Edgar Yoshio Morales Teraoka; Tomohiro Kita; Atsushi Tsukazaki; Masashi Kawasaki; Hirohito Yamada
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Paper Abstract

We present a fabrication procedure for ZnO channel waveguides intended for nonlinear optical applications. Ar ion milling was used to etch the single crystal thin film samples, and the effects of bias power, chamber pressure and Ar flow rate were investigated, finding optimal parameters for waveguide fabrication. The effect of sidewall roughness was estimated by comparing the results of cut-back measurements and an analytical model. We show an easy and effective method for the fabrication of ZnO channel waveguides.

Paper Details

Date Published: 23 March 2011
PDF: 7 pages
Proc. SPIE 7940, Oxide-based Materials and Devices II, 79401F (23 March 2011); doi: 10.1117/12.874439
Show Author Affiliations
Edgar Yoshio Morales Teraoka, Tohoku Univ. (Japan)
Tomohiro Kita, Tohoku Univ. (Japan)
Atsushi Tsukazaki, The Univ. of Tokyo (Japan)
PRESTO, Japan Science and Technology Agency (Japan)
Masashi Kawasaki, Tohoku Univ. (Japan)
CRESTO, Japan Science and Technology Agency (Japan)
Hirohito Yamada, Tohoku Univ. (Japan)


Published in SPIE Proceedings Vol. 7940:
Oxide-based Materials and Devices II
Ferechteh Hosseini Teherani; David C. Look; David J. Rogers, Editor(s)

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