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Proceedings Paper

Optimization of half-tone technology for diffractive microlens fabrication
Author(s): V. P. Korolkov; R. K. Nasyrov; A. R. Sametov; S. A. Suhih
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Paper Abstract

A new approach for the optimization of diffractive microlenses fabrication is presented. The problem is that fabrication process brings errors in profile formation. These errors decrease diffractive efficiency and wavefront quality. However, microlens quality can be increased by optimization of the fabrication process that takes into account transfer functions of technological equipment. We have applied this method for half-tone technology. Calibration samples were fabricated and transfer function was experimentally measured. Then initial half-tone mask was corrected and microlenses with higher quality were produced.

Paper Details

Date Published: 7 February 2011
PDF: 7 pages
Proc. SPIE 7957, Practical Holography XXV: Materials and Applications, 795710 (7 February 2011); doi: 10.1117/12.874432
Show Author Affiliations
V. P. Korolkov, Institute of Automation and Electrometry (Russian Federation)
R. K. Nasyrov, Institute of Automation and Electrometry (Russian Federation)
A. R. Sametov, Institute of Automation and Electrometry (Russian Federation)
S. A. Suhih, Institute of Automation and Electrometry (Russian Federation)


Published in SPIE Proceedings Vol. 7957:
Practical Holography XXV: Materials and Applications
Hans I. Bjelkhagen, Editor(s)

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