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Proceedings Paper

Atomic layer epitaxy of TiO2/ZnO multilayer optics using ZnO buffer layer for water-window x-ray
Author(s): Masaki Murata; Yuji Tanaka; Yasutaka Sanjo; Hiroshi Kumagai; Tsutomu Shinagawa; Masaya Chigane
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Paper Abstract

A novel TiO2/ZnO multilayer deposited by atomic layer epitaxy technique has been fabricated to achieve a high reflective mirror and an attosecond chirped mirror in soft-x-ray "water-window" (λ=2.332-4.368 nm) wavelengths region. The technique in this study is able to satisfy reguirements for atomic layer control through epitaxial growth using sequential surface reaction and self-limiting nature. In preliminary experimental studies, both rutile TiO2 (200) and wurtzite ZnO (0001) thin films were grown epitaxially on the same sapphire (0001) substrates at 450°C and moreover a high reflectivity of 29.8% was obtained at around 2.734 nm and a grazing angle of 2θ=10°. The authors conducted the ALE experiment of TiO2/ZnO multilayer using a ZnO buffer layer. As a result, the multilayer using a buffer layer was able to be grown epitaxially on not only sapphire (0001) but also Si (100). In addition, reflectivity of multilayer remained to be 24.6% even on Si (100) in contrast with that about 27.5% on sapphire (0001) at grazing angle of 2θ = 8°. Thus, the ZnO buffer layer becomes the key layer to fabricate the TiO2/ZnO multilayer on various substrates. In the presentation, ALE of TiO2/ZnO multilayer mirrors using buffer layer will be shown in detail.

Paper Details

Date Published: 14 February 2011
PDF: 9 pages
Proc. SPIE 7927, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV, 79270Q (14 February 2011); doi: 10.1117/12.874377
Show Author Affiliations
Masaki Murata, Osaka City Univ. (Japan)
Yuji Tanaka, Osaka City Univ. (Japan)
Yasutaka Sanjo, Osaka City Univ. (Japan)
Hiroshi Kumagai, Osaka City Univ. (Japan)
Tsutomu Shinagawa, Osaka Municipal Technical Research Institute (Japan)
Masaya Chigane, Osaka Municipal Technical Research Institute (Japan)


Published in SPIE Proceedings Vol. 7927:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV
Winston V. Schoenfeld; Jian Jim Wang; Marko Loncar; Thomas J. Suleski, Editor(s)

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